Tempress has developed an alternative atmospheric process called High Density POCl3. The HD system benefits from the throughput advantage of small pitch, back-to-back, and long flatzone. Using improved chemistry and hardware adaptions, excellent uniformity and efficiencies are obtained.
High Throughput PECVD
Tempress SPECTRE is a batch-type PECVD system for SiOx and SiNx deposition on silicon solar cells. It uses the benefits of a direct plasma system while maintaining good color uniformities.