Inline PECVD Solar Systems

Manufacturing outsourcing by PST Co., Ltd.

• Large area electrode - wide range deposition

• Direct RF plasma, Capacitive Coupled plasma

• Easy maintenance, large chamber lid

• Compact footprint

• Temp. range, up to 600 0C

• Very easy operation, by touch panel

• Proven mass production capability

• Anti-reflection coating with good Hydrogenation properties (10 – 30%)

• Uniformity within wafer 2,5%, WF to WF 3,5%, Batch to Batch 3%

Options:

• In situ cleaning (optional)

• CVE Chamber (PSG Dry Etch)