Solar Cell Processing Systems

3-4 tube furnaces, flat zones of 800 - 1100 mm
Load up to 500 wafers per tube
Max. wafer size 200 x 200 mm
Temperature range available 380 - 1350 ^oC
P & N type diffusion/oxidation/CVD processes
Fast cool down, controlled, more than 20 ^oC/min.
Furnace control by:
- Digital Temperature Controller (DTC)
- Digital Proces Controller (DPC)
- Colour TFT touchscreen
Tempress data management system
Loading by Softlander system
Loading automation/waferhandling system available:
- Longboat elevator system
- Mass Wafer transfer system
- Plastic carrier stocker system
- Including cooldown and pre-load positions
Low maintenace
High quality, performance and full support.