The Small Batch Vertical Furnace (SBVF) can process wafers up to 200 mm. The dual tube vertical furnace is loaded by a single wafer robot system. This system allows sequential processing, with wafers being transferred from one process tube to the other in inert atmosphere.
Key system features
- Dual tube configuration, 40 cm flat zone
- Controlled ambient capability
- Sequential processing
- Side-by-side positioning with a small footprint
- The Tempress load port can handle up to 4 cassettes
- Designed for R&D and flexible small production
- Single wafer robot handling (fully automatic loading)
- ATM, LPCVD, Oxide & Poly Processes
- Wafer size 150 and 200 mm wafers
Customer benefits
- Ideal for small batch processing, short queing time in manufacturing line
- Flexible batch loading for R&D and piloto line production
- Dual tube design option for high volume processing