The SPECTRUM 200/300 platform is designed for high temperature processing in the semiconductor power and MEMS industries. The system is tailor made for high volume manufacturing of 200mm or 300mm wafers, with its five individually controlled furnace stacks and elongated temperature flat zones. Fully automated, capable of CVD and ALD processing, high temperature diffusion, oxidation and deposition processes.
Key system features:
- Up to 200 wafer loads per batch, 5 stacks per furnace
- Fully automated wafer transfer
- Uniform process results over the entire load
- High throughput, less systems needed, less cleanroom space needed
- Fully automated solution, limited operator interference
- Stable production