The POCl3 diffusion process is the most suitable and versatile method for creating of an n-type dopant layer. Based on 40 years of experience, Tempress has established a POCl3 diffusion platform capable of delivering the most stable, reproducible and versatile process conditions at the lowest cost of ownership.

Key system features

  • 5 independent tubes, fine pitch back-to-back processing
  • Uniform process results over the entire load
  • Pre-installed process recipes for up to 140 Ω/sq sheet resistance with good within-wafer uniformity
  • Integrated automation available
  • >10 years equipment lifetime
  • Up to 210 mm wafer size

Customer benefits

  • Plug and play solution, proven in production
  • Fast process qualification
  • Tempress’ experience with >30GW installed POCl3 capacity worldwide
  • Access to Tempress’ comprehensive in-house knowledge concerning diffusion processes, ranging from stable emitter formation for the mass production of p-type solar cells to low doped emitters for advanced cell concepts and process integration