TS 12806
The fully automated, horizontal furnace cluster
The horizontal furnace cluster TS 12806 is optimized for high volume production and cleanroom space. With its modular design the TS 12806 is available with up to six process chambers that can independently and simultaneously run wet oxidation/anneal processes.. The TS 12806 is future proof with its upgradeable and configurable soft- and hardware and the wafer handling can be optionally expanded with stocker functionality.
Benefits.
Read about our benefits using the links below
One furnace, multiple processes.
- Range of wet oxidation/ anneal processes combined in one tool
- Modular designed
- Upgradable, configurable hard- and software
- Extended process capabilities and improvements
Optimized cleanroom footprint.
- Wafer size capability up to 300 mm
- Stack flexibility 2 x 3 tubes
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Waferload up to 75 x 300 mm wafers
Higher process stability and yield.
- Tempress proprietary and well proven Digital Temperature Controller (DTC) for temperatures upto 1350 degrees Celsius delivers unprecedented temperature stability over long time.
- Each tube has an individual DTC for optimum temperature control.
Long economic lifetime, ready for the future.
- Modular design
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Reliable industrial components
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Upgradable and configurable hard- and software
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Self-diagnostics capabilities
High uptime and process availability.
- Shorter repair times.
- Use of high quality, industrial components
- Support in process optimization
- Easy acces to Tempress expert knowledge
Easy operation and high security.
- Easy formulation and adaptation of process recipes and distribution over different furnaces without advanced programming skills
- Data logging allowing improved feedback loops and improved process quality and yield
- Touch screen user interface intuitive and easy to use for operators and process technologists Improved user management allowing easy operation, protection against flaws and improved security
- UI (User Interface) to control the entire furnace, process, recipe editing, control and monitor motions, boat movements, logging and analyses process variables and overview of the machine user interface
- Semi S2 certification optionally
Easy to integrate.
- Flexible interface between automation and furnace
- Integrated 6 axis robot for wafer transfer
- Proven wafer transfer system
- Supporting 300 mm wafers
Extra options
- SECS/GEM E30 or SEMI 300
- OHT interface
- Automatic Foup ports
- Storage/buffer positions
- Foup stocker
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System Characteristics
TS 12806 Horizontal cluster furnaces
| # tubes | 2 x 3 |
| Wafer size | 300 mm |
| Cleanroom | ISO 4 compatible |
Temperature
| Flatzone | 800 mm TS12 within ±0,5 °C |
| Control | Cascade PID, accuracy ±0,1 °C |
| Maximum | 1300°C process |
| Optional | Fast cooldown |
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Contact
the T-Team.
- sales@tempress.nl
- +31-578-699200
- Radeweg 31, 8171 MD, Vaassen