The TS series is Tempress’ versatile horizontal furnace system that is configurable to meet our customer demands in the semiconductor, solar, MEMS and photonics industries. Its use ranges from small batch R&D and pilot line production purposes, to high volume manufacturing processing. Tempress R&D systems are used in many advanced research centers worldwide, with state of the art proccesses and continuously new process developments.

Key system features

  • Multipurpose atmospheric and CVD processing chambers available, applicable to any kind of silicon wafer, i.e. 100mm-300mm round (semiconductor) wafers, 125 – >156mm square (solar) wafers
  • Batch processing from 25 up to 1000 wafers per tube
  • Modular set up of the equipment, 1-4 tubes. Empty tubes are retrofittable in the future with additional/new processing
  • Atmospheric processes: annealing (N2, forming gas), dry/wet oxide, POCl3, BBr3
  • LPCVD processes: doped/undoped poly, silicon nitride, TEOS, LTO, HTO, SIPOS
  • ALD: Al2O3, TiO2, HfO2
  • Small footprint, manually loaded, or fully automated wafer transfer tools available

Customer benefits

  • From lab to fab: All processes are easily exchangeable from lab scale to high volume manufacturing
  • Full process and service support team available, direct from Tempress headquarters
  • High level of flexibility in choice of processing
  • All systems are backwards compatible. This guarantees full support at any time in the future for your Tempress furnace equipment
  • Access to Tempress’ comprehensive in-house knowledge of semiconductor processing which can be applied to Solar cell manufacturing solutions as well